Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, SUSS MicroTec Falcon, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FalconSUSS MicroTec | |
|---|---|---|
| OEM | Headway | SUSS MicroTec |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | Wafer Backside Rinse |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | SUSS MicroTec Falcon |
| Specifications | ||
| Vacuum requirement | 23" Hg[1] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Electrical power | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Configuration | — | Polyimid[2] |
| Cassette Elevators | — | 2[2] |
| Developer Dispensers | — | 2[2] |
| Wafer size | — | Wafer Backside Rinse[2] |
| Number of Hot Plates | — | 0[2] |
| Number of Chill Plates | — | 0[2] |
| Controller Type | — | Microprocessor Controller[2] |
| Power Requirements | — | 380 V, 50/60 Hz, 3 Phase[2] |
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