SUSS MicroTec
Falcon
What it is
General reference — not yet source-verifiedThe SUSS MicroTec Falcon is a resist processing tool in the wafer back-side rinse developer class.
How it works
General reference — not yet source-verifiedA resist processing developer applies and removes liquid chemistry in controlled chambers to develop patterned photoresist on wafers and to rinse the wafer after processing.
Where it fits in the process flow
General reference — not yet source-verifiedA resist processing developer sits in the lithography flow after coating and exposure and before later pattern transfer steps.
Applications
What do the numbers mean?
Power & electrical1
Wafer handling3
Gas & chemistry3
Control & software1
Configuration & options12
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What does a resist processing system do?General reference — not yet source-verified
A resist processing system applies and treats photoresist or related liquid coatings on substrates, then performs thermal and wet-chemical steps needed to prepare or develop patterned films.
Is this type of tool used only before exposure?General reference — not yet source-verified
No. Machines of this class are used both before exposure for coating and pre-bake operations and after exposure for post-exposure bake, development, rinsing, and drying.
Why is uniformity important in this equipment class?General reference — not yet source-verified
Uniformity in coating, temperature, and chemical action directly affects linewidth control, pattern transfer quality, adhesion, and defect performance in downstream fabrication steps.
What kinds of materials are typically processed on such systems?General reference — not yet source-verified
Such systems commonly process photoresists, adhesion promoters, developers, rinses, edge-bead removal chemistries, and other spin-applied or wet-processed materials used in lithographic patterning.
Not publicly documented
The following facts about the Falcon are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Falcon are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Falcon are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Falcon are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Falcon are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Falcon is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 17, 2026.
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