Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, SUSS MicroTec Falcon ACS 200 Coater Developer Cluster, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Falcon ACS 200 Coater Developer ClusterSUSS MicroTec | |
|---|---|---|
| OEM | Headway | SUSS MicroTec |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | SUSS MicroTec Falcon |
| Cited variants | — |
|
| Specifications | ||
| Vacuum requirement | 23" Hg[2] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[2] | — |
| Electrical power | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[2] | — |
| Configuration | — | Developer (4)[1] |
| Wafer Sizes | — | 4, 5, 6, 8 inch[3] |
| Configuration (Asset #142142) | — | Developer (4) 2000 Vintage[1] |
| Configuration (Asset #142141) | — | Coater (3) 2000 Vintage[3] |
| OEM | — | SUSS[1] |
| Model | — | Falcon ACS 200[4] |
| Equipment type | — | Coater / Developer Cluster System[4] |
| Category | — | Resist Processing[4] |
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