Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, Veeco 3303 Lift Off, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 3303 Lift OffVeeco | |
|---|---|---|
| OEM | Headway | Veeco |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | Veeco 33xx |
| Specifications | ||
| Vacuum requirement | 23" Hg[1] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Electrical power | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| HPC solvent lift off process | — | 500-2300 PSI1)[2] |
| Configuration | — | HVS (High Velocity Spray) Chamber up to 40 PSI[2] |
| Model | — | 3303[2] |
| Machine type | — | Lift Off Machine[3] |
| Wafer size | — | 6 inch[2] |
| Process | — | HPC solvent lift off process[2] |
| Process pressure | — | 500-2300 PSI[2] |
| Chamber pressure | — | up to 40 PSI[3] |
| OEM | — | Veeco / SSEC[2] |
| HVS chamber pressure | — | up to 40 PSI[2] |
| Vintage | — | 2006[2] |
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