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Veeco

3303 Lift Off

Resist ProcessingVeeco 33xx family
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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Veeco 3303 Lift Off is a lift-off process machine for 6-inch wafers. The Veeco 3303 Lift Off uses an HPC solvent lift off process of 500-2300 PSI. The Veeco 3303 Lift Off has an HVS (High Velocity Spray) chamber up to 40 PSI.[1][2]

3303 Lift Off — Inventory photo
Fig. 013303 Lift OffInventory photo[1]

Vacuum

500-2300 PSI[1]

Gas delivery

500-2300 PSI1)[1]

What it is

The Veeco / SSEC 3303 Lift Off is a semiconductor manufacturing machine designed for the lift-off process on six-inch wafers.[1][2]

How it works

The 3303 uses a high-pressure chemical solvent lift-off process rated at 500 to 2300 PSI.[1][2]

The machine includes a High Velocity Spray (HVS) chamber operating at up to 40 PSI.[1][2]

What do the numbers mean?

Vacuum & pumping4

HVS (High Velocity Spray) Chamber up to 40 PSI[1]
Accurate?
Process pressure
500-2300 PSI[1]
Accurate?
Chamber pressure
up to 40 PSI[2]
Accurate?
HVS chamber pressure
up to 40 PSI[1]
Accurate?

Wafer handling1

Wafer size
6 inch[1]
Accurate?

Gas & chemistry2

HPC solvent lift off process
500-2300 PSI1)[1]
Accurate?
Process
HPC solvent lift off process[1]
Accurate?

Configuration & options5

Model
3303[1]
Accurate?
Machine type
Lift Off Machine[2]
Accurate?
HVS (High Velocity Spray) chamber[2]
Accurate?
OEM
Veeco / SSEC[1]
Accurate?
Vintage
2006[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • HPC solvent lift off process500-2300 PSI1)[1]
  • ConfigurationHVS (High Velocity Spray) Chamber up to 40 PSI[1]
  • ProcessHPC solvent lift off process[1]
  • Process pressure500-2300 PSI[1]
  • Chamber pressureup to 40 PSI[2]
  • HVS chamber pressureup to 40 PSI[1]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What process does the Veeco 3303 Lift Off use?

The Veeco 3303 Lift Off uses an HPC solvent lift off process.[2][1]

Does the Veeco 3303 Lift Off include a high velocity spray chamber?

The Veeco 3303 Lift Off includes an HVS high velocity spray chamber.[2][1]

Not publicly documented

The following facts about the 3303 Lift Off are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 3303 Lift Off are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 3303 Lift Off are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 3303 Lift Off are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 3303 Lift Off are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 3303 Lift Off is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
  3. [3]Inventory photo
  4. [4]Inventory photo
  5. [5]Inventory photo
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Last updated Oct 19, 2026.

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