Comparison ledger
Hitachi S 4100 FE-SEM, KLA .496 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | S 4100 FE-SEMHitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi S 4100 FE-SEM | KLA .496 PSL Wafer |
| Specifications | ||
| Configuration | Manually operated 5 axis specimen chamber[1] | NIST Traceable[3] |
| Secondary electron image resolution | 2.0nm at 30 KV[1] | — |
| Magnification | 20X - 300KX[1] | — |
| Electron gun | cold field emission source[1] | — |
| Lens type | electromagnetic[1] | — |
| Objective aperture | 4 position externally selectable[1] | — |
| Stigmator | octopole electromagnetic[1] | — |
| Scanning coil | 2-stage electromagnetic[1] | — |
| Airlock | prepumped[1] | — |
| Stage motion | 5 axis manual, X/Y: 25mm, Z: 5-30mm, T: -5° - +45°, R: 360° (continuous)[1] | — |
| Draw-out door | Max sample size: 150mm diameter[1] | — |
| Instrument type | Field emission scanning electron microscope[2] | — |
| Sample handling | Manually operated sample handling[2] | — |
| Manually operated 5 axis specimen chamber | Present[1] | — |
| Manually operated specimen exchange port | Present[1] | — |
| Maximum sample size, Size Type I | 100mm diameter[1] | — |
| Stage motion, Size Type I | 5 axis manual, X/Y: 25mm, Z: 5-30mm, T: -5° - +45°, R: 360° (continuous)[1] | — |
| Draw-out door maximum sample size | 150mm diameter[1] | — |
| Maximum sample size, Size Type II | 150mm diameter[1] | — |
| Stage motion, Size Type II | 5 axis manual, X/Y: 100mm/50mm, Z: 5 - 35mm, T: -5° - +60°, R: 360° (continuous)[1] | — |
| Image display | Dual 12" monitors[1] | — |
| Scanning mode | Normal, reduced area, line scan, photo scan, spot position, split screen[1] | — |
| Scanning speed | TV, 0.3, 2, 9, 25, 35, 100, 160, 320 s/frame[1] | — |
| Vacuum system operation | Full automatic operation with pneumatic valve control[1] | — |
| Ultimate vacuum, electron gun chamber | 10(-7) Pa[1] | — |
| Ultimate vacuum, specimen chamber | 10(-4) Pa[1] | — |
| Ion pump | 60 L/s X1, 20 L/s X2[1] | — |
| Specimen chamber pump | DP (570 L/s)[1] | — |
| Foreline | Rotary pump X2[1] | — |
| Optional accessory | EDX at 30° take off angle[1] | — |
| Installation power | Single phase AC 220 or 240 volt, 50/60 Hz[1] | — |
| Grounding | Independent grounding 100 Ohms or less[1] | — |
| Vintage | 1993[1] | — |
| Ultimate vacuum | 10(-7) Pa in electron gun chamber, 10(-4) Pa in specimen chamber[1] | — |
| Specimen chamber | DP (570 L/s)[1] | — |
| EDX | at 30° take off angle[1] | — |
| Digital image capturing | Orion-6 software, optional[1] | — |
| Wafer size | — | 8 inch[3] |
| Traceability | — | NIST Traceable[3] |
| Compatible systems | — | Capable on Surfscan 6xy0 and SP1[3] |
| Category | — | Metrology & Inspection[4] |
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