Hitachi
S 4100 FE-SEM
The Hitachi S 4100 FE-SEM is a field emission scanning electron microscope. The Hitachi S 4100 FE-SEM has manually operated sample handling. The Hitachi S 4100 FE-SEM uses a cold field emission source.[1][2]
What it is
The Hitachi S 4100 FE-SEM is a field emission scanning electron microscope. The Hitachi S 4100 FE-SEM is used in metrology and inspection. The Hitachi S 4100 FE-SEM has a cold field emission source. The Hitachi S 4100 FE-SEM uses manually operated sample handling, including a manually operated 5 axis specimen chamber and a manually operated specimen exchange port.[3][1][2]
How it works
The Hitachi S 4100 FE-SEM uses a cold field emission electron gun. The Hitachi S 4100 FE-SEM uses electromagnetic lenses, an octopole electromagnetic stigmator, and a 2 stage electromagnetic scanning coil. The Hitachi S 4100 FE-SEM is specified for secondary electron image resolution of 2.0 nm at 30 KV and magnification from 20X to 300KX. The Hitachi S 4100 FE-SEM has a 4 position externally selectable objective aperture.[3][1]
The Hitachi S 4100 FE-SEM has a prepumped airlock. The Hitachi S 4100 FE-SEM has full automatic vacuum operation with pneumatic valve control. The Hitachi S 4100 FE-SEM is specified for ultimate vacuum of 10(-7) Pa in the electron gun chamber and 10(-4) Pa in the specimen chamber. The Hitachi S 4100 FE-SEM uses ion pumps rated at 60 L/s and 20 L/s, and the specimen chamber uses a DP rated at 570 L/s.[3][1]
Where it fits in the process flow
General reference — not yet source-verifiedA metrology and inspection SEM is typically placed in analytical and defect review workflows rather than in the main material deposition or pattern transfer path. A tool of this class is commonly used after patterning, etch, film formation, cleaning, or planarization steps when engineers need direct imaging of surface features or defects. A tool of this class also supports failure analysis and process characterization by providing higher detail than routine optical inspection.
Applications
The Hitachi S 4100 FE-SEM supports secondary electron imaging and offers scanning modes that include normal, reduced area, line scan, photo scan, spot position, and split screen. The Hitachi S 4100 FE-SEM uses dual 12 inch monitors for image display. The Hitachi S 4100 FE-SEM includes real time processing, auto brightness and contrast control, dynamic stigmator autofocus, frame averaging, frame integration, and contrast conversion. The Hitachi S 4100 FE-SEM can be upgraded with a National Instruments Vision Acquisition computer imaging system, and optional accessories include EDX at 30 degree take off angle and digital image capturing with Orion-6 software.[3]
What do the numbers mean?
Power & electrical1
Vacuum & pumping8
Optics & imaging5
- Electron Optics:[3]
Control & software3
- Can be upgraded with a National Instruments Vision Acquisition computer imaging system[3]
Configuration & options32
- Manually operated 5 axis specimen chamber[3]
- Manually operated specimen exchange port[3]
- Specifications:[3]
- Performance[3]
- Sample Chamber:[3]
- Size Type I[3]
- Max sample size 100mm diameter[3]
- Size Type II[3]
- Stage motion, Size Type I
- 5 axis manual, X/Y: 25mm, Z: 5-30mm, T: -5° - +45°, R: 360° (continuous)[3]
- Stage motion, Size Type II
- 5 axis manual, X/Y: 100mm/50mm, Z: 5 - 35mm, T: -5° - +60°, R: 360° (continuous)[3]
- Stage motion
- 5 axis manual, X/Y: 100mm/50mm, Z: 5 - 35mm, T: -5° - +60°, R: 360° (continuous)[3]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Airlockprepumped[3]
- Vacuum system operationFull automatic operation with pneumatic valve control[3]
- Ultimate vacuum, electron gun chamber10(-7) Pa[3]
- Ultimate vacuum, specimen chamber10(-4) Pa[3]
- Ion pump60 L/s X1, 20 L/s X2[3]
- Specimen chamber pumpDP (570 L/s)[3]
- ForelineRotary pump X2[3]
- Installation powerSingle phase AC 220 or 240 volt, 50/60 Hz[3]
- Ultimate vacuum10(-7) Pa in electron gun chamber, 10(-4) Pa in specimen chamber[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of electron source does the Hitachi S 4100 FE-SEM use?
The Hitachi S 4100 FE-SEM uses a cold field emission source.[3][1][2]
What resolution and magnification are specified for the Hitachi S 4100 FE-SEM?
The Hitachi S 4100 FE-SEM is specified for secondary electron image resolution of 2.0 nm at 30 KV and magnification from 20X to 300KX.[3][1]
How is specimen handling configured on the Hitachi S 4100 FE-SEM?
The Hitachi S 4100 FE-SEM has a manually operated 5 axis specimen chamber and a manually operated specimen exchange port.[3][1]
What vacuum system details are specified for the Hitachi S 4100 FE-SEM?
The Hitachi S 4100 FE-SEM has full automatic vacuum operation with pneumatic valve control. The Hitachi S 4100 FE-SEM is specified for ultimate vacuum of 10(-7) Pa in the electron gun chamber and 10(-4) Pa in the specimen chamber. The Hitachi S 4100 FE-SEM uses ion pumps rated at 60 L/s and 20 L/s, and the specimen chamber uses a DP rated at 570 L/s.[3]
Not publicly documented
The following facts about the S 4100 FE-SEM are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S 4100 FE-SEM are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the S 4100 FE-SEM are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the S 4100 FE-SEM are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the S 4100 FE-SEM are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the S 4100 FE-SEM is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Hitachi S 4100 FE-SEM family | Waferpedia — waferpedia.comwaferpedia.com
- [3]Inventory photo
Last updated Oct 16, 2026.
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