Waferpedia

Comparison ledger

1.112 PSL WaferversusMX80

KLA 1.112 PSL Wafer, Olympus MX80, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
MX80Olympus
OEMKLAOlympus
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA 1.112 PSL WaferOlympus MX80
Specifications
ConfigurationNIST Traceable[1]—
Wafer Size8 inch[1]—
NIST TraceableTrue[1]—
Compatible ToolsSurfscan 6xy0 and Sp1[2]—
Objectives—1.25x, 5x, 10x, 20x, 50x, and 100x[3]
Eyepiece—10x binocular eyepiece[3]
Camera—Optronics MagnaFire camera with capture software[3]
Image analysis software—ImagePro Plus[3]
Dark field imaging—Available for 5x through 100x objectives[3]
Nomarski imaging—Included for 5x through 100x objectives[3]
Illumination—Top and bottom illumination[3]
UV filter—For imaging photoresist[3]
Output—Photo printer[3]
Dark field—Available for 5x through 100x objectives[3]
Viewing head—Ergonomic tilting trinocular erect image head[4]
Nosepiece—Motorized nosepiece[4]
Stage—Large stage with clutch[4]
Head—Ergonomic tilting head with super widefield eyepieces[5]
Imaging modes—Brightfield, darkfield, and Nomarski illumination[5]
Eyepieces—10x binocular eyepiece[3]
Photo printer—Included[3]
Power—12v 100w halogen[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  4. [4]microscopecentral.commicroscopecentral.com
  5. [5]spectraservices.comspectraservices.com
  6. [6]waferpedia.comwaferpedia.com