Comparison ledger
KLA 1.112 PSL Wafer, Onto Innovation S 300 ULTRA II Transparent Film Metrology, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | S 300 ULTRA II Transparent Film MetrologyOnto Innovation | |
|---|---|---|
| OEM | KLA | Onto Innovation |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | Onto Innovation S 300 ULTRA II Transparent Film Metrology |
| Specifications | ||
| Configuration | NIST Traceable[1] | 50/60 Hz[3] |
| Wafer Size | 8 inch[1] | 12 inch[4] |
| NIST Traceable | True[1] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[2] | — |
| Robot Finger Type | — | Brooks ABM 407[4] |
| Load Port Type | — | Brooks FIXLOAD (x2) with FOUP capability[3] |
| Light source | — | laser 633 nm HeNe and solid-state 780 nm , and 905 nm[3] |
| UV lamp | — | 190nm to 400nm[3] |
| Spot size | — | 50 μm DUV and 2.5 μm/15 μm /50 μm (high medium and low magnification) visible /IR[3] |
| Power | — | 50/60 Hz[4] |
| Spectroscopic Reflectometry Range | — | 190 nm to 905 nm[4] |
| Enhanced Modulated Scanning Monochrometer | — | for DUV range[3] |
| OMA Detector | — | for the visible/IR range[3] |
| Manufacturer | — | Onto Innovation[4] |
| Model | — | S 300 ULTRA II Transparent Film Metrology[3] |
| Category | — | Metrology & Inspection[4] |
| Electrical | — | 100-240 Vac 1 N/PE[3] |
| Light Source | — | laser 633 nm HeNe, solid-state 780 nm, and 905 nm[3] |
| Spot Size | — | 50 μm DUV and 2.5 μm / 15 μm / 50 μm visible/IR[3] |
| Optics | — | OMA detector for the visible/IR range[4] |
| Measurement Capability | — | DUV, visible/IR, and UV measurement capabilities[4] |
| Vintage | — | 2005[3] |
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