Waferpedia

Comparison ledger

200 versus 2135

KLA 200 and KLA 2135, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
200KLA
2135KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA 200KLA 2135
Specifications
Supported equipment familyKLA 200 series pattern inspection stations[1]
Related supported equipmentKLA Tencor 300 Series Pattern Inspection Stations, STARlight tools, and URSA tools[1]
Data hub function9X Fileservers are central data hubs serving KLA Tencor reticle inspection equipment[1]
Software function9X System Software supports storage and retrieval of setup and result files and several analysis functions[1]
Product typewafer inspection system[2]
Technologyadvanced sensor and image processing technologies[2]
Inspection methodbrightfield, small-pixel, high data rate, digital image processing technology[2]
Defect detectiondetects all types of yield-relevant defects on all process layers[2]
Operational usein-line monitoring of advanced processes[2]
Throughputtwo- to three-times throughput improvement over the earlier model KLA 2132[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org