Waferpedia

Comparison ledger

200 versus P-2

KLA 200 and KLA P-2, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
200KLA
P-2KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size200mm
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA 200KLA P-2
Specifications
Supported equipment familyKLA 200 series pattern inspection stations[1]
Related supported equipmentKLA Tencor 300 Series Pattern Inspection Stations, STARlight tools, and URSA tools[1]
Data hub function9X Fileservers are central data hubs serving KLA Tencor reticle inspection equipment[1]
Software function9X System Software supports storage and retrieval of setup and result files and several analysis functions[1]
ModelP-2[2]
OEMKLA Tencor[2]
Equipment typeProfilometer[2]
Sample table200 mm sample table with vacuum[3]
Measurement rangeMeasures steps from 100 Å to 300 µm[3]
Maximum sample thickness20 mm[3]
Minimum sample length25 mm[3]
Feature3D scan option[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  3. [3]nanofab.ece.cmu.edunanofab.ece.cmu.edu