Comparison ledger
KLA .204 PSL Wafer, KLA 2800, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2800KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | KLA 2800 |
| Specifications | ||
| Configuration | NIST Traceable[1] | SMAC board[4] |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| Inspection type | — | Broadband brightfield DUV/UV/VIS[7] |
| Wavelengths | — | Multiple wavelengths (DUV/UV/VIS)[7] |
| Design rule support | — | Sub-65-nm (extends to 45-nm and beyond)[7] |
| Throughput improvement | — | 2X better than previous-generation DUV tool[7] |
| Optical modes | — | Array of optical modes for optimal sensitivity per layer/design/process[7] |
| Defect classification | — | Advanced binning and realtime defect classification[7] |
| Sensitivity and contrast | — | Maximum sensitivity and best material contrast for critical defects across all layers[7] |
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