Comparison ledger
KLA .204 PSL Wafer, Zeiss Leo 1525, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Leo 1525Zeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | Zeiss Leo 1525 |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| Instrument type | — | Scanning Electron Microscope (SEM)[4] |
| Description | — | High resolution FE-SEM[5] |
| Column technology | — | Gemini[5] |
| Accelerating voltages | — | 0.5 kV to 20 kV[5] |
| Resolution at 20 kV | — | 1.5 nm[5] |
| Resolution at 1 kV | — | 3.5 nm[5] |
| Stage XY range | — | 10 cm[5] |
| Detectors | — | In-lens, secondary electrons, EDX[5] |
| EDX energy resolution | — | 123.8 eV (calibrated Mn Kalpha)[5] |
| EBL maximum writefield | — | 5×5 mm[5] |
| EBL ultimate resolution | — | 20 nm[5] |
| Pattern generator | — | RAITH ELPHY Plus[5] |
| Field emission gun | — | Present[5] |
| Secondary electron detector | — | Everhardt-Thornley[5] |
| Beam stability | — | Better than 0.5% per hour[5] |
| Category | — | Metrology & Inspection[4] |
| Gemini objective lens design | — | Combines electrostatic and magnetic fields[5] |
| In-lens detection concept | — | Detects secondary and backscattered electrons in parallel[5] |
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