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Comparison ledger

.204 PSL WaferversusLeo 1530 FE-SEM

KLA .204 PSL Wafer, Zeiss Leo 1530 FE-SEM, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMKLAZeiss
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA .204 PSL WaferZeiss LEO
Specifications
ConfigurationNIST Traceable[1]Four-Quadrant Backscattered Electron Detector (4QBSD)[4]
Wafer Size8 inch[2]—
TraceabilityNIST[3]—
Compatible ToolsSurfscan 6xy0, Sp1[1]—
NIST TraceableYes[2]—
Compatible toolsSurfscan 6xy0 and Sp1 particle counters[2]—
OXFORD 6901 EDX Detector with resolution—133 eV at 5.9 KeV[4]
Determination area—10 mm²[4]
Detectors—Four-Quadrant Backscattered Electron Detector (4QBSD), E-T Detector, In-lens detector[4]
EDX Detector—OXFORD 6901 EDX Detector with resolution 133 eV at 5.9 KeV, determination area 10 mm²[4]
Resolution—Sub-nanometer[5]
Voltage Range—0.2-30 kV[5]
Maximum Substrate Size—6 inch[5]
Stage—Motorized x/y/z axes[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]inventory listing
  5. [5]nnci.netnnci.net