Comparison ledger
KLA .204 PSL Wafer, Zygo Newview 5000 Optical, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | Zygo |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | Zygo Newview |
| Specifications | ||
| Configuration | NIST Traceable[1] | Windows NT[4] |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| Lens | — | x50[4] |
| Motorized Stage | — | X, Y Only[4] |
| Instrument type | — | Optical profilometer[4] |
| Measurement type | — | Non-contact 3D surface profiler[5] |
| Measurement technique | — | Scanning white light interferometry[5] |
| Stage | — | Motorized X/Y stage[4] |
| Control system | — | Windows NT[4] |
| Objectives | — | 5x, 10x, 50x[5] |
| Vertical resolution | — | 0.1-20nm[5] |
| Lateral resolution range | — | 0.64–2.6μm[5] |
| Maximum vertical step height | — | 5mm[5] |
| Vertical scan rate | — | ≤ 10μm/sec[5] |
| Sample types | — | Opaque and transparent surfaces[5] |
| Maximum roughness | — | ≤ 100μm Rp[5] |
| Reflectivity | — | 4-100%[5] |
| Maximum sample thickness | — | 104mm[5] |
| Working distance at 5x objective | — | 9.3mm[6] |
| Working distance at 10x objective | — | 7.4mm[6] |
| Working distance at 50x objective | — | 3.4mm[6] |
| Extended scan length | — | Up to 5000um[6] |
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