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2132 versus Starlight 301 300 SL Inspection Measurement

KLA 2132 and KLA Starlight 301 300 SL Inspection Measurement, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
2132KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA 2132KLA Starlight 301 300 SL Inspection Measurement
Specifications
Product typeWafer inspection system[1]
Relationship to KLA 2135Earlier model than the KLA 2135[1]
Wafer size (primary)200mm (8")[2]
Wafer size (alternate)4", 5", 6" capable[2]
Throughput2–8 wafers per hour[2]
Sensitivity>0.25 µm pixels[2]
Inspection typePatterned wafer defect inspection[2]
OpticsBrightfield, small-pixel, high data rate digital image processing[1]
User interfaceDOS operating system[3]
SAT capabilitySegmented Auto Threshold (SAT) included[2]
Calibration wafer8" DSW calibration wafer included[2]
Vintage (year of introduction)1995[2]
Voltage208 Vac[4]
Configuration50/60 Hz[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]gsemi.comgsemi.com
  3. [3]tbcl.com.twtbcl.com.tw
  4. [4]inventory listing