Comparison ledger
KLA 2139 UI Brightfield Patterned Surface Defect and KLA 5200, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 5200KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 2139 | KLA 5200 |
| Specifications | ||
| Configuration | Ultra-Broadband Illumination[1] | — |
| Measurement technology | — | Coherence Probe Microscopy (CPM), a patented white-light interferometric technique[2] |
| Targets measured | — | Surfaces, including low-contrast or grainy targets[2] |
| Feature size capability stated | — | Down to 0.18 µm[2] |
| Software | — | Built-in analysis software[2] |
| User interface | — | Graphical user interface[2] |
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