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KLA

5200

Metrology & InspectionKLA 5200 family
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The KLA 5200 is an overlay metrology system. The KLA 5200 uses Coherence Probe Microscopy (CPM), a patented white-light interferometric technique. The KLA 5200 can measure feature sizes down to .18 µm.[1]

5200 — web.archive.org
Fig. 015200web.archive.org[1]

What it is

General reference — not yet source-verified

Overlay metrology tools measure how accurately one patterned layer is positioned relative to another on a wafer. Overlay metrology sits alongside lithography process control and feeds correction and qualification workflows for patterning.

How it works

The KLA 5200 uses Coherence Probe Microscopy, a patented white-light interferometric technique. The KLA 5200 uses that method to identify surfaces rather than only edges. The KLA 5200 includes built-in analysis software and a graphical user interface for production operation, in-line process qualification, and off-line engineering analysis.[1][3]

Where it fits in the process flow

The KLA 5200 helps chipmakers tighten process specifications, improve process control, and reduce time to market on advanced products with feature sizes down to .18 µm. The KLA 5200 can improve stepper utilization and support long-term control. The KLA 5200 provides data intended to prevent lithography process errors and manage the overlay budget as feature sizes shrink.[1][3]

Applications

The KLA 5200 is used for overlay metrology for advanced lithography. The KLA 5200 can measure all layers, including low-contrast or grainy targets.[1][3]

  • Overlay metrology for advanced lithography
  • In-line process qualification
  • Off-line engineering analysis

What do the numbers mean?

Performance3

insp
Overlay Registration System/6in.[2]
Accurate?
Type
Comprehensive overlay metrology system[1]
Accurate?
Application
Overlay metrology for advanced lithography[1]
Accurate?

Control & software2

Software
Built-in analysis software[1]
Accurate?
User interface
Graphical user interface[1]
Accurate?

Configuration & options5

Measurement technology
Coherence Probe Microscopy (CPM), a patented white-light interferometric technique[1]
Accurate?
Targets measured
Surfaces, including low-contrast or grainy targets[1]
Accurate?
Feature size capability stated
Down to 0.18 µm[1]
Accurate?
Feature size capability
down to 0.18 µm[1]
Accurate?
Targets measured
All layers, including low-contrast or grainy targets[1]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What type of equipment is the KLA 5200?

The KLA 5200 is an overlay metrology system for advanced lithography.[1][3][4]

What measurement method does the KLA 5200 use?

The KLA 5200 uses Coherence Probe Microscopy, a patented white-light interferometric technique.[1][3]

What does the KLA 5200 detect when measuring targets?

The KLA 5200 identifies surfaces rather than only edges.[1][3]

What target types can the KLA 5200 measure?

The KLA 5200 can measure all layers, including low-contrast or grainy targets.[1][3]

Not publicly documented

The following facts about the 5200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 5200 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 5200 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 5200 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 5200 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 5200 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]dealer listingwotol.com
  3. [3]5200 — KLA | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
  4. [4]5200 Overlay Measurement — KLA | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
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Last updated Oct 20, 2026.

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