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Comparison ledger

2351 versus OmniMap Auto RS 75 Resistivity Mapper

KLA 2351 and KLA OmniMap Auto RS 75 Resistivity Mapper, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
2351KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer sizeWafer Transfer System
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA 2351KLA OmniMap
Specifications
ConfigurationWith HDD & Software[1]50/60 Hz[3]
Load Port Qty2[1]
Wavelength Illumination370~720 nm[1]
Wavelength BandVisible, UV[1]
Pixel Size0.16μm / 0.20μm / 0.25μm / 0.39μm / 0.62μm[1]
Array Defect Capture Rate≥90% (0.16 um, 0.20 um, 0.25 um, 0.39 um, 0.62 um sensitivities)[1]
Array False Defect Rate≤1.5%(all sizes)[1]
Random Defect Capture Rate≥90% (0.16 um, 0.20 um, 0.25 um, 0.39 um, 0.62 um sensitivities)[1]
Random False Defect Rate≤1.5% (all sizes)[1]
Repeatability≥90% (20 consecutive run on the same DSW wafer)[1]
Wafer sizeWafer Transfer System[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing