Comparison ledger
KLA .496 PSL Wafer, KLA FLX 2320, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FLX 2320KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | KLA FLX 2320 |
| Specifications | ||
| Configuration | NIST Traceable[1] | Refurbished[3] |
| Wafer size | 8 inch[1] | — |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | — |
| Dual Wavelength Scanning | — | 670 nm, 785 nm[3] |
| Software Version | — | 4.4[3] |
| Operation Manual | — | Digital Copy[3] |
| Manufacturer | — | KLA[3] |
| Model | — | FLX 2320[3] |
| Wafer sizes | — | 4, 5, 6, 8 inch[3] |
| Measurement principle | — | Laser interferometer measuring curvature before and after film deposition[4] |
| Operating temperature | — | room temperature to 500 C[3] |
| Stress range | — | 1 MPa to 4 GPa[4] |
| Scan rate | — | 6 seconds per scan[4] |
| Repeatability | — | 1 MPa[4] |
| Resolution | — | 1 MPa[4] |
| Two-dimensional mapping | — | Supported[4] |
| Operating system | — | Windows 3.1[3] |
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