Waferpedia

Comparison ledger

.498 PSL WaferversusMX80

KLA .498 PSL Wafer, Olympus MX80, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
MX80Olympus
OEMKLAOlympus
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA .498 PSL WaferOlympus MX80
Specifications
ConfigurationNIST Traceable[1]—
NIST traceabilityYes[1]—
OEMKLA[1]—
CategoryMetrology & Inspection[1]—
TraceabilityYes[1]—
DescriptionParticle-sizing calibration standard[1]—
Objectives—1.25x, 5x, 10x, 20x, 50x, and 100x[2]
Eyepiece—10x binocular eyepiece[2]
Camera—Optronics MagnaFire camera with capture software[2]
Image analysis software—ImagePro Plus[2]
Dark field imaging—Available for 5x through 100x objectives[2]
Nomarski imaging—Included for 5x through 100x objectives[2]
Illumination—Top and bottom illumination[2]
UV filter—For imaging photoresist[2]
Output—Photo printer[2]
Dark field—Available for 5x through 100x objectives[2]
Viewing head—Ergonomic tilting trinocular erect image head[3]
Nosepiece—Motorized nosepiece[3]
Stage—Large stage with clutch[3]
Head—Ergonomic tilting head with super widefield eyepieces[4]
Imaging modes—Brightfield, darkfield, and Nomarski illumination[4]
Eyepieces—10x binocular eyepiece[2]
Photo printer—Included[2]
Power—12v 100w halogen[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  3. [3]microscopecentral.commicroscopecentral.com
  4. [4]spectraservices.comspectraservices.com
  5. [5]waferpedia.comwaferpedia.com