Comparison ledger
KLA 5200 and KLA Archer XT+ Overlay Measurement, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 5200KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 5200 | KLA Archer |
| Specifications | ||
| Measurement technology | Coherence Probe Microscopy (CPM), a patented white-light interferometric technique[1] | — |
| Targets measured | Surfaces, including low-contrast or grainy targets[1] | — |
| Feature size capability stated | Down to 0.18 µm[1] | — |
| Software | Built-in analysis software[1] | — |
| User interface | Graphical user interface[1] | — |
| Software version | — | 5.60[2] |
| Configuration | — | New / Refurbished Items:[2] |
| New system consumable parts | — | Shutter, HLS Lamp & Air Filters[2] |
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