Comparison ledger
KLA Alpha Step D 300 Stylus and KLA P-2, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | P-2KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA Alpha Step | KLA P-2 |
| Specifications | ||
| Configuration | Issue with the style module[1] | — |
| Instrument type | Stylus-based surface profiler[2] | — |
| Stylus tip radius | 2 µm[2] | — |
| Step height measurement range | 50 nm to 300 µm[2] | — |
| Measurement principle | Stylus placed in contact with and dragged along the substrate surface; vertical deflection measures change in step height[2] | — |
| Supported substrate types | Silicon, Silicon Germanium, Quartz, Sapphire, Glass, Germanium, Silicon Carbide, Gallium Nitride, III-V, Gallium Arsenide, Polymer, Carbon Polymer Based, Lithium Niobate[2] | — |
| Supported substrate sizes | Pieces, 2 inch, 3 inch, 4 inch, 6 inch wafer[2] | — |
| Maximum load | 1[2] | — |
| Cleanliness | Flexible[2] | — |
| Stylus scan distance used in roughness testing | 3 mm[3] | — |
| Manufacturer location | KLA-Tencor Corporation, Milpitas, CA[3] | — |
| Model | — | P-2[4] |
| OEM | — | KLA Tencor[4] |
| Equipment type | — | Profilometer[4] |
| Sample table | — | 200 mm sample table with vacuum[5] |
| Measurement range | — | Measures steps from 100 Å to 300 µm[5] |
| Maximum sample thickness | — | 20 mm[5] |
| Minimum sample length | — | 25 mm[5] |
| Feature | — | 3D scan option[5] |
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