Waferpedia

Comparison ledger

Altair 8900 Defect versus P-2

KLA Altair 8900 Defect and KLA P-2, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
P-2KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size200mm
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA Altair 8900 DefectKLA P-2
Specifications
ConfigurationFor CMOS Image Sensor Applications[1]
ModuleTwo Main Devices and a Set of UPS[1]
Wires5, Phases: 3[1]
Max AIC10,000[1]
Volts AC208 V[1]
Amps25[1]
Freq50 / 60 Hz[1]
SCCR (A)5,000[1]
ModelP-2[2]
OEMKLA Tencor[2]
Equipment typeProfilometer[2]
Sample table200 mm sample table with vacuum[3]
Measurement rangeMeasures steps from 100 Å to 300 µm[3]
Maximum sample thickness20 mm[3]
Minimum sample length25 mm[3]
Feature3D scan option[3]

Plan your fab

Building a Metrology & Inspection process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  3. [3]nanofab.ece.cmu.edunanofab.ece.cmu.edu