Comparison ledger
KLA OP 5240 Film Thickness Measurement, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | |
|---|---|---|
| OEM | KLA | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1988– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA OP 5240 | Nikon 1505 |
| Specifications | ||
| Configuration | Patterned, unpatterned[1] | 5" reticle[3] |
| Voltage | 230 V, 50/60 Hz[1] | — |
| Software Revision Level | TFMS Rev 4.1a32[1] | — |
| 1 Prealigner, Brooks, Model | PRE-201-CE[1] | — |
| 1 ATM-Robot, single EEF, Brooks, Model | ATM-105-1-DE (controller ESC-212)[1] | — |
| Manufacturer | KLA / Therma-wave[1] | — |
| Model | OP 5240[1] | 1505 G 6 E[3] |
| Tool type | Film thickness measurement system[2] | — |
| Wafer sizes | 6 inch, 8 inch[1] | — |
| Process capability | Patterned, unpatterned[1] | — |
| Power | 230 V, 50/60 Hz[1] | — |
| Software revision | TFMS Rev 4.1a32[1] | — |
| Wafer handling | 1 ATM-Robot, single EEF, Brooks, Model ATM-105-1-DE (controller ESC-212)[2] | — |
| Accessories | Light-Pen; VGA Monitor (Main Application); TFT (video)[1] | — |
| Resolution | — | 650 nm[4] |
| Numerical Aperture | — | 0.54[4] |
| Reduction | — | 5x[4] |
| Exposure Field | — | 15 x 15 mm[4] |
| Alignment Accuracy | — | 130 nm[4] |
| Wafer Size | — | 4 inch[3] |
| Light Source | — | g-line[5] |
| Introduction Year | — | 1988[4] |
| NA (Numerical Aperture) | — | 0.54[4] |
| Make | — | Nikon[3] |
| Category | — | Stepper[3] |
| Wafer Sizes | — | 4 inch[3] |
| Exposure type | — | g-line[4] |
| NA | — | 0.54[4] |
| Exposure field | — | 9.3 x 18.8 mm[4] |
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