Waferpedia

Comparison ledger

P-17 versus P-2

KLA P-17 and KLA P-2, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
P-17KLA
P-2KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size200mm
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA P-17KLA P-2
Cited variants
  • Tencor P-17 OF (Open Frame)[1]
Specifications
Instrument typeMechanical profilometer[2]
Z range1 mm[2]
Vertical resolution0.6 Å[2]
Lateral resolution0.5 µm[2]
Step height rangeNanometers to 1000 µm[1]
Constant force control0.03 to 50 mg[1]
Scan length (without stitching)200 mm[1]
Video camera5 MP high-resolution color[1]
Stylus tip radius options40 nm to 50 µm[3]
Stylus included angle options20 to 100 degrees[3]
Sample chuck range50 to 200 mm[1]
ModelP-2[4]
OEMKLA Tencor[4]
Equipment typeProfilometer[4]
Sample table200 mm sample table with vacuum[5]
Measurement rangeMeasures steps from 100 Å to 300 µm[5]
Maximum sample thickness20 mm[5]
Minimum sample length25 mm[5]
Feature3D scan option[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]kla.comkla.com
  2. [2]epfl.chepfl.ch
  3. [3]kla.comkla.com
  4. [4]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  5. [5]nanofab.ece.cmu.edunanofab.ece.cmu.edu