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KLA

P-17

Metrology & InspectionKLA P-17 family
Research Quality: 60% complete

The KLA Tencor P-17 is an eighth-generation benchtop stylus profiler that measures 2D and 3D surface topography, including step height from nanometers to 1 mm, roughness, bow, and stress. The P-17 can scan the full diameter of a sample up to 200 mm without needing to stitch scans together.[1][2]

KLAP-17
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What it is

The KLA Tencor P-17 is a stylus profiler, also referred to as a profilometer, used for measuring surface topography. The P-17 is the eighth generation of the P-series stylus profilers from KLA (formerly KLA-Tencor). The system offers a programmable scan stage, low noise, and sub-angstrom electronic resolution throughout the vertical range, enabling high resolution scans across the entire sample surface.[2][5][1]

How it works

The P-17 uses an UltraLite sensor assembly that combines a large linear vertical range with constant force control. The stylus force can be set from 0.03 mg to 50 mg, and the system automatically maintains the applied force regardless of the feature height. The vertical range is up to 1 mm, and the vertical resolution is 0.6 angstrom (0.6 Å). The lateral resolution is 0.5 µm.[2][3][5]

The P-17 supports both 2D and 3D scans. Data analysis includes step height, roughness, waviness, bow, and stress measurements. The Apex software platform provides advanced filtering, leveling, and analysis functions, and supports over forty surface parameters. Measurement recipes can be automated using pattern recognition and sequencing, and the system is compliant with SEMI S2, S8, S14, and CE standards.[2][6]

Where it fits in the process flow

In the fab process flow, stylus profilometry typically follows film deposition or removal steps to confirm film thickness uniformity, etch depth, or post-CMP planarity. The P-17's ability to measure entire 200 mm substrates without stitching allows full wafer characterization. The open-frame variant (P-17 OF) extends capability to 300 mm wafers or even larger samples, supporting applications in LED, power device, and data storage manufacturing.[1][2]

Applications

Application areas include semiconductor and compound semiconductor devices (e.g., AlTiC, GaAs, Si, SiC, sapphire wafers), MEMS and optical electronics (microlens step height, etch depth), LED and power devices (MESA step height, ITO step height, epitaxial stress), and data storage (thin film head wafers, sliders, pole-tip recession). The Defect Review application allows characterization of killer defects such as scratches and pits.[2][5]

What do the numbers mean?

Wafer handling1

Sample chuck range
50 to 200 mm[1]
Accurate?

Optics & imaging4

Vertical resolution
0.6 Å[3]
Accurate?
Lateral resolution
0.5 µm[3]
Accurate?
Video camera
5 MP high-resolution color[1]
Accurate?
Stylus tip radius options
40 nm to 50 µm[2]
Accurate?

Control & software1

Constant force control
0.03 to 50 mg[1]
Accurate?

Dimensions & facilities1

Step height range
Nanometers to 1000 µm[1]
Accurate?

Configuration & options4

Instrument type
Mechanical profilometer[3]
Accurate?
Z range
1 mm[3]
Accurate?
Scan length (without stitching)
200 mm[1]
Accurate?
Stylus included angle options
20 to 100 degrees[2]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Tencor P-17 OF (Open Frame)Larger frame to allow loading of larger samples; can be configured for 300 mm wafers or a 240 x 240 mm chuck.kla.com[1]
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What replaced it?

  • siblingKLA D600Listed in the same metrology equipment section.source[4]

Where are the manuals?

Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.

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Not publicly documented

Field notes

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Frequently asked questions

What is the vertical range of the KLA Tencor P-17?

The vertical range is up to 1 mm (1000 µm).[3][2][1]

What is the lateral resolution of the P-17?

The lateral resolution is 0.5 µm.[3]

What is the maximum scan length without stitching on the P-17?

The P-17 can scan up to 200 mm without the need for stitching.[2][1]

Does the P-17 have an open-frame variant for larger samples?

Yes, the Tencor P-17 OF (Open Frame) offers a larger frame to accept samples up to 300 mm wafers or a 240 x 240 mm chuck.[1][2]

What types of materials and applications is the P-17 used for?

The P-17 is used for metrology on materials including AlTiC, GaAs, Si, SiC, and sapphire wafers. Applications include step height, roughness, stress, bow, and defect review in semiconductors, LED, power devices, MEMS, and data storage.[2][5]

Not publicly documented

The following facts about the P-17 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the P-17 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the P-17 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the P-17 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the P-17 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the P-17 are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (7)Every fact above is drawn from these public sources
  1. [1]kla.comkla.comkla.com
  2. [2]kla.comkla.comkla.com
  3. [3]epfl.chepfl.chepfl.ch
  4. [4]epfl.chepfl.ch
  5. [5]KLA Tencor P-17 Stylus Profiler — Columbia Nano Initiativecni.columbia.educni.columbia.edu
  6. [6]KLA Tencor P-17 Profilometer - Interdisciplinary Institute for Technological Innovation - Université de Sherbrookeusherbrooke.causherbrooke.ca
  7. [7]Candela CS20 Automatic Defect Detection - Wafer Defect Inspection System | KLA-Tencorkla-tencor.com (Jul 18, 2014)web.archive.org
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Last updated Sep 1, 2026.

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