Waferpedia

Comparison ledger

P-2 versus P-20H

KLA P-2 and KLA P-20H, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
P-2KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size200mm
Process node
Introduced
Production run
LifecycleLegacy
Lifecycle milestones
Control system
Generation
FamilyKLA P-2KLA P-20H
Specifications
ModelP-2[1]
OEMKLA Tencor[1]
Equipment typeProfilometer[1]
Sample table200 mm sample table with vacuum[2]
Measurement rangeMeasures steps from 100 Å to 300 µm[2]
Maximum sample thickness20 mm[2]
Minimum sample length25 mm[2]
Feature3D scan option[2]
Tool typeStylus profilometer[3]
Stylus tip radius2 µm[3]
Stylus cone angle60°[3]
Vertical range325 µm[3]
Sensor elementCapacitive sensor element[3]
Motion stagePrecision motion stage[3]
Vertical resolutionRoughly nm scale[3]
Stage movement8 inch[3]
Serial number09940111[3]
Tool ownerJoseph Jacob[3]
Access modeWalk-up tool (no reservation needed)[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  2. [2]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  3. [3]nanofab.utah.edunanofab.utah.edu