Waferpedia

Comparison ledger

P-2 versus P-7

KLA P-2 and KLA P-7, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
P-2KLA
P-7KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size200mm
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA P-2KLA P-7
Specifications
ModelP-2[1]
OEMKLA Tencor[1]
Equipment typeProfilometer[1]
Sample table200 mm sample table with vacuum[2]
Measurement rangeMeasures steps from 100 Å to 300 µm[2]
Maximum sample thickness20 mm[2]
Minimum sample length25 mm[2]
Feature3D scan option[2]
equipment typeStylus profilometer[3]
equipment type categoryTopographical Metrology[4]
equipment name as listedStep Profilometer (KLA Tencor P-7)[4]
Step Height RangeNanometers to 1000 µm[5]
Stylus Tip Radius2 µm[6]
Stylus Bevel60°[6]
Max Scan Length150 mm[7]
Vertical Range1 mm[7]
Sample SizeUp to 150 mm[7]
Sampling RateHigher sampling rates increase data resolution, but can introduce noise above 200 Hz[6]
Applied Force0.03 to 50 mg[5]
Stylus MaterialDiamond[5]

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Sources (7)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  2. [2]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  3. [3]tmi.utexas.edutmi.utexas.edu
  4. [4]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  5. [5]kla.comkla.com
  6. [6]research.yale.eduresearch.yale.edu
  7. [7]pnf.uchicago.edupnf.uchicago.edu