Waferpedia

Comparison ledger

P 22 H Surface versus P-7

KLA P 22 H Surface and KLA P-7, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
P-7KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA PKLA P-7
Specifications
ConfigurationStep Height Precision Micro 2D Scanner[1]
Scan Length60 mm[1]
Scan Speed1 um/sec to 25mm/ sec[1]
Scan MethodBi-directional moving stylus[1]
Sampling Rate5, 10, 20, 50, 100, 200, 500 , 1000 Hz[1]Higher sampling rates increase data resolution, but can introduce noise above 200 Hz[5]
Stylus ForceAdjustable between 0.05 ~ 50mg[1]
Step Height Repeatability, 10.75 nm or 0.1%:Sample Handling:[1]
Theta360[1]
equipment typeStylus profilometer[2]
equipment type categoryTopographical Metrology[3]
equipment name as listedStep Profilometer (KLA Tencor P-7)[3]
Step Height RangeNanometers to 1000 µm[4]
Stylus Tip Radius2 µm[5]
Stylus Bevel60°[5]
Max Scan Length150 mm[6]
Vertical Range1 mm[6]
Sample SizeUp to 150 mm[6]
Applied Force0.03 to 50 mg[4]
Stylus MaterialDiamond[4]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]tmi.utexas.edutmi.utexas.edu
  3. [3]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  4. [4]kla.comkla.com
  5. [5]research.yale.eduresearch.yale.edu
  6. [6]pnf.uchicago.edupnf.uchicago.edu