Comparison ledger
Lam Research 2300 e 4 Kiyo MCX Metal, Plasma-Therm Versalock 700 ICP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2300 e 4 Kiyo MCX MetalLam Research | Versalock 700 ICPPlasma-Therm |
|---|---|---|
| OEM | Lam Research | Plasma-Therm |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research 2300 e 4 Kiyo MCX Metal | Plasma-Therm Versalock 700 ICP |
| Specifications | ||
| Manufacturer | Lam Research[1] | — |
| Model | 2300 e 4 Kiyo MCX Metal[1] | — |
| Process type | Metal etch[1] | — |
| Configuration | — | Dual Chamber Etcher[2] |
| Phase | — | 3 Phase[3] |
| Frequency | — | 60 Hz[3] |
| Voltage | — | 208V[3] |
| Pumps | — | 3 Edward Pumps[2] |
| Chillers | — | 2 Neslab Chillers[2] |
| Control system update | — | Vortex Computer Update[2] |
| Vintage | — | 1998[3] |
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