Comparison ledger
Lam Research 4520 XL, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 4520 XLLam Research | 110Tegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4520 | Tegal 110 |
| Cited variants |
|
|
| Specifications | ||
| Software Version | E1.6.1-002[3] | — |
| Main UI (No PC Remote) | Pentium 33 NextStep[3] | — |
| Configuration | PC functions but fan needs changing[3] | — |
| Model | 4520 XL[3] | — |
| Manufacturer | Lam Research[3] | — |
| Category | Etch[4] | — |
| Wafer sizes | 8 inch[3] | — |
| Main UI | Pentium 33 NextStep[3] | — |
| PC status | PC functions but fan needs changing[3] | — |
| Process application | Contact etch, planarization, via etch, trench mask etch, pad etch[5] | — |
| Operating pressure | 30-200 mtorr[5] | — |
| Aspect ratio | 5:1 or greater[5] | — |
| Selectivity | ≥ 50:1 for contact and ≥ 30:1 for via etch[5] | — |
| BPSG etch rate | >8000 A/min[5] | — |
| TEOS etch rate | >6000 A/min[5] | — |
| Uniformity | +/- 7% 3σ[5] | — |
| Selectivity BPSG/TEOS to poly | > 30:1[5] | — |
| Particles | <0.06/cm2 at >0.3μm size[5] | — |
| Uptime | ≥ 85%[5] | — |
| MTTC | < 6 hours[5] | — |
| MTBF | ≥ 125 hours[5] | — |
| MTTR | ≤ 4 hours[5] | — |
| Feature | Multifrequency diode[5] | — |
| model | — | 110 SE[2] |
| application focus | — | process development applications[2] |
| process capability | — | deep silicon plasma etching[2] |
| capabilities | — | very high aspect ratio trench etch and profile control[2] |
| configuration | — | multiple configurations with minimum technical intervention[2] |
| System type | — | plasma etch system[6] |
| Supported components | — | MEMS and 3D-IC components[2] |
| Control capability | — | very high aspect ratio trench etch and profile control[6] |
| Physical description | — | compact[2] |
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