Waferpedia

Tegal

110

EtchTegal 110 family
Research Quality: 50% complete
Email

The Tegal 110 SE is a compact, flexible plasma etch system for process development applications. The Tegal 110 SE supports deep silicon plasma etching for MEMS and 3D-IC components. The Tegal 110 SE offers very high aspect ratio trench etch and profile control capabilities.[1][2]

110 — web.archive.org
Fig. 01110web.archive.org[1]

How it works

The Tegal 110 SE allows multiple configurations with minimum technical intervention. The Tegal 110 SE offers very high aspect ratio trench etch and profile control capabilities.[1][2]

What can it run?

Process applications and technology nodes documented for this tool.

  • process development applications
  • MEMS
  • 3D-IC components
  • deep silicon plasma etching

What do the numbers mean?

Control & software2

capabilities
very high aspect ratio trench etch and profile control[1]
Accurate?
Control capability
very high aspect ratio trench etch and profile control[2]
Accurate?

Configuration & options8

model
110 SE[1]
Accurate?
application focus
process development applications[1]
Accurate?
process capability
deep silicon plasma etching[1]2 sources
Accurate?
multiple configurations with minimum technical intervention[1]2 sources
Accurate?
System type
plasma etch system[2]
Accurate?
Supported components
MEMS and 3D-IC components[1]
Accurate?
Physical description
compact[1]
Accurate?
Physical description
flexible[2]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
110 SE———web.archive.org[1]
Interested in this tool?
Need help with this tool?Embed spec card

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What kind of equipment is the Tegal 110 SE?

The Tegal 110 SE is a plasma etch system for process development applications.[1]

Not publicly documented

The following facts about the 110 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 110 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the 110 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 110 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 110 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 110 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
Was this page accurate?

Last updated Oct 20, 2026.

Compare with similar tools

View all →