Comparison ledger
Lam Research Rainbow 4420, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4420Lam Research | 110Tegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1994 Vintage year | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4420 | Tegal 110 |
| Cited variants |
|
|
| Specifications | ||
| Configuration | Refurbished[3] | — |
| Software version | Envision 1.5 Release[1] | — |
| Handler System | Harmonics Arm (2)[1] | — |
| Volts | 208[1] | — |
| Wafer Shape | 8" flat zone[4] | — |
| Process | Poly Etch[4] | — |
| Software | Envision 1.5[4] | — |
| Wafer Aligner | Universal[5] | — |
| Wafer Sizes | 8 inch[1] | — |
| Software Version | Envision 1.5[1] | — |
| CIM SECS | Yes[1] | — |
| Factory Interface | SMIF (2)[1] | — |
| LL Pump | Yes[1] | — |
| TCU 2080 | Yes[1] | — |
| AC Rack | Yes[1] | — |
| PC Pump | Yes[1] | — |
| Vintage | 1994[1] | — |
| Dry Pump | Yes[4] | — |
| Chiller | Yes[4] | — |
| model | — | 110 SE[2] |
| application focus | — | process development applications[2] |
| process capability | — | deep silicon plasma etching[2] |
| capabilities | — | very high aspect ratio trench etch and profile control[2] |
| configuration | — | multiple configurations with minimum technical intervention[2] |
| System type | — | plasma etch system[6] |
| Supported components | — | MEMS and 3D-IC components[2] |
| Control capability | — | very high aspect ratio trench etch and profile control[6] |
| Physical description | — | compact[2] |
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