Comparison ledger
Lam Research SEZ SP 203 Spin, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SEZ SP 203 SpinLam Research | 110Tegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research SEZ SP 203 | Tegal 110 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 50/60 Hz[2] | — |
| Voltage | 400 VAC[2] | — |
| Max. Current | 32 A[2] | — |
| Breaking Capacity | 10.000 AIC[2] | — |
| Power | 400V, 50 Hz, 3-Phase[3] | — |
| Phase | ENI VL-400 Phase Shift Controller[3] | — |
| Roughing Pump Code | A532-80-905[3] | — |
| OEM | Lam Research[4] | — |
| Model | SEZ SP 203 Spin[2] | — |
| Category | Etch[4] | — |
| Tool type | Spin etcher[4] | — |
| Wafer size | 150mm[5] | — |
| Vintage | 1999[5] | — |
| Process pump status | Process pump in one chemical cabinet (sub tool) has malfunction[2] | — |
| model | — | 110 SE[1] |
| application focus | — | process development applications[1] |
| process capability | — | deep silicon plasma etching[1] |
| capabilities | — | very high aspect ratio trench etch and profile control[1] |
| configuration | — | multiple configurations with minimum technical intervention[1] |
| System type | — | plasma etch system[6] |
| Supported components | — | MEMS and 3D-IC components[1] |
| Control capability | — | very high aspect ratio trench etch and profile control[6] |
| Physical description | — | compact[1] |
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