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Comparison ledger

SEZ SP 203 Spinversus1512e

Lam Research SEZ SP 203 Spin, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
SEZ SP 203 SpinLam Research
1512eTegal
OEMLam ResearchTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research SEZ SP 203Tegal 1512e
Specifications
Configuration50/60 Hz[1]—
Voltage400 VAC[1]—
Max. Current32 A[1]—
Breaking Capacity10.000 AIC[1]—
Power400V, 50 Hz, 3-Phase[2]—
PhaseENI VL-400 Phase Shift Controller[2]—
Roughing Pump CodeA532-80-905[2]—
OEMLam Research[3]—
ModelSEZ SP 203 Spin[1]—
CategoryEtch[3]—
Tool typeSpin etcher[3]Industrial RIE plasma etcher system[5]
Wafer size150mm[4]—
Vintage1999[4]—
Process pump statusProcess pump in one chemical cabinet (sub tool) has malfunction[1]—
Stated configuration—With modules assembly for CI-4222[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]csisemi.comcsisemi.com
  5. [5]semistarcorp.comsemistarcorp.com