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05 LHP 151versusNanospec 210 Thin Film Measurement

Melles Griot 05 LHP 151, Onto Innovation Nanospec 210 Thin Film Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
05 LHP 151Melles Griot
OEMMelles GriotOnto Innovation
CategoryPrecision OpticsPrecision Optics
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyMelles Griot 05Onto Innovation Nanospec 210 Thin Film Measurement
Specifications
ConfigurationWith 05 LPL 340 Power Supply (Does not power on)[1]—
Equipment typeLaser[1]Thin film measurement system[3]
MakeMelles Griot[1]—
Model05 LHP 151[1]Nanospec 210[3]
Power stateDoes not power on[1]—
Manufacturer—Onto Innovation[3]
Thickness range—100 to 500,000 angstroms[4]
Typical measurement time—2.5 seconds[4]
Spot size—50 um with 5x objective; 25 um with 10x objective; 6.5 um with 40x objective[4]
Film types measured—Oxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide[4]
Reflectance mode—Thick Films[4]
Reproducibility—5A ± 5% depending upon the film type[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]tech-semi.comtech-semi.com