Comparison ledger
Nikon 1505 G 6 E, SUSS MicroTec MA 200 CC Exposure, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | MA 200 CC ExposureSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | SUSS MicroTec MA 200 |
| Specifications | ||
| Configuration | 5" reticle[1] | Damaged or Shortage:[4] |
| Resolution | 650 nm[2] | — |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | MA 200 CC[5] |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| OEM | — | SUSS MicroTec[5] |
| Tool type | — | Lithography exposure tool[5] |
| Alignment mode | — | Top-side alignment[6] |
| Operation mode | — | Cassette to cassette operation[6] |
| Wafer capability | — | Up to 8"/200mm wafer capable[6] |
| Lamp house | — | 1000 Watt[6] |
| Power supply | — | Suss CIC 1000 Power Supply[6] |
| Optics | — | UV400 Optics for 365nm and 405nm exposure[6] |
| Objectives | — | 5x and 10x objectives[6] |
| Auto-alignment system | — | Suss Auto-alignment System[6] |
| Microscope | — | Suss DVM8 Microscope[6] |
| Vintage | — | 1999[6] |
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