SUSS MicroTec
MA 200 CC Exposure
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The SUSS MicroTec MA 200 CC Exposure is a lithography exposure tool. The SUSS MicroTec MA 200 CC Exposure is configured for top-side alignment. The SUSS MicroTec MA 200 CC Exposure is up to 8"/200mm wafer capable.[1][2]
What it is
General reference — not yet source-verifiedMask aligners are lithography tools used to align a photomask to a substrate and expose photosensitive resist with patterned light. Mask aligners are commonly used in microfabrication flows for pattern transfer on wafers and related substrates.
How it works
The MA200CC main system is configured as an automatic mask aligner. The MA 200 CC can be configured for top side alignment. The MA 200 CC can operate cassette to cassette. The MA 200 CC can include a SUSS auto-alignment system and a SUSS DVM8 microscope. The MA 200 CC can include a lamp house rated at 1000 watt. The MA 200 CC can include UV400 optics for 365 nm and 405 nm exposure. The MA 200 CC can include 5x and 10x objectives.[2]
Where it fits in the process flow
General reference — not yet source-verifiedMask aligners sit in the lithography portion of a fabrication flow after resist coating and prebake, and before development and pattern transfer. Mask aligners are used when a process requires patterned exposure of photoresist on a substrate for later etch, deposition, implant, or lift-off steps.
Applications
Why won't it start?
Documented failure modes, common issues, and field considerations.
- CIC controller missing
- Lamp power supply missing
What do the numbers mean?
Power & electrical3
- Lamp power supply[3]
Wafer handling2
Optics & imaging4
- Automatic mask aligner[2]
Performance2
Control & software1
- CIC controller[3]
Configuration & options5
- Damaged or Shortage:[3]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the MA 200 CC Exposure are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 200 CC Exposure are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 200 CC Exposure are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 200 CC Exposure are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the MA 200 CC Exposure is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MA 200 CC Exposure are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]classoneequipment.com — classoneequipment.comclassoneequipment.com
- [3]Inventory photo
Last updated Oct 19, 2026.
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