Comparison ledger
Nikon NSR S 208 D, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 208 DNikon | 1000 FamilyUltratech |
|---|---|---|
| OEM | Nikon | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR S 208 | Ultratech 1000 Family |
| Specifications | ||
| Configuration | Software ver. MCSW 180-P12/OCSW ver. 180-P10[1] | — |
| CIM | SECs[1] | — |
| Process | kRF[1] | — |
| Handler System | external FOUP system[1] | — |
| Factory Interface | SMIF[1] | — |
| Wavelength | 248 nm[2] | — |
| Lens NA | 0.82[2] | — |
| Exposure Area | 26 x 33 mm[2] | — |
| Reduction Ratio | 1/4[2] | — |
| Resolution | <110 nm[2] | — |
| Throughput (300 mm) | >147 wph[2] | — |
| Throughput (200 mm) | >165 wph[2] | — |
| Wafer Size | 200/300 mm[2] | — |
| Software Version | MCSW 180-P12 / OCSW ver. 180-P10[1] | — |
| Components | Amp Rack, Temperature Controller, Cymer Laser, Air Conditioner[1] | — |
| Throughput | 300 mm > 147 WPH; 200 mm > 165 WPH[2] | — |
| Included modules | Amp Rack; Temperature Controller; Cymer Laser; Air Conditioner[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[3] |
| Optical design | — | Wynne Dyson[3] |
| Magnification | — | 1X[3] |
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