Nikon
The Nikon NSR-S208D is a 248 nm deep UV scanner for 110 nm devices and sub-critical 90 nm layers. The NSR-S208D features a 0.82 NA lens and delivers >147 wph on 300 mm wafers.[1]

Lithography steppers project a patterned reticle image onto photoresist-coated wafers. Lithography steppers are core patterning tools in semiconductor manufacturing.
Lithography tools are used after wafer preparation, film formation, and photoresist coating, and before development, pattern transfer, and resist stripping. Lithography exposure defines the pattern that later etch or implant steps will follow.
KrF lithography tools are used to print critical device patterns in semiconductor process flows. Lithography exposure can be applied to layers that require precise imaging and overlay so that later process steps reproduce the intended circuit geometry.
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The Nikon NSR-S208D uses a 248 nm exposure wavelength.[1]
The following facts about the NSR S 208 D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR S 208 D are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSR S 208 D are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR S 208 D are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR S 208 D are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NSR S 208 D is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 18, 2026.
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