Comparison ledger
OAI Model 30, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Model 30OAI | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | OAI | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | OAI Model 30 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Product family | UV Exposure Systems[1] | — |
| Type | Benchtop collimated UV exposure system[2] | — |
| Source type | Stabilized arc lamp source[2] | — |
| Optical integrator | Adjustable optical integrator[2] | — |
| Output spectra | 220 nm to 450 nm[3] | — |
| Output power | 200 W to 12 kW[3] | — |
| Beam size | Up to 24 in²[3] | — |
| Timer range | 0.1 to 0.999 seconds[3] | — |
| Collimation | Reflective Köhler illumination design[2] | — |
| Beam divergence | ≤ ±1.5°[2] | — |
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