OAI
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
UV exposure systems for lithography direct ultraviolet radiation onto resist-coated substrates to deliver a controlled exposure dose. UV light sources in this class are used where a process needs uniform optical energy without the mask alignment functions of a mask aligner.
The OAI Model 30 collects light with an ellipsoidal reflector and focuses it using OAI proprietary optical integrator technology to produce a highly uniform UV beam at the exposure plane. The OAI Model 30 accepts quick-change filter assemblies for customizing the output spectrum. The OAI Model 30 uses dual channel feedback circuits to control intensity and keep it constant over the lamp lifetime. The OAI Model 30 shutter timer activates the light source shutter.[3]
UV light sources for lithography are used after a substrate has been coated with a photosensitive layer and before development or other post-exposure treatment. Flood exposure tools in this class support process steps where blanket or broadly distributed ultraviolet energy is needed rather than contact or projection pattern transfer.
Process applications and technology nodes documented for this tool.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The OAI Model 30 consists of a stand-alone light source, a constant intensity controller, and a shutter timer.[3]
The OAI Model 30 collects light with an ellipsoidal reflector and focuses it using OAI proprietary optical integrator technology to produce a highly uniform UV beam at the exposure plane.[3]
The OAI Model 30 provides output power ranging from 200W to 12kW.[3]
The following facts about the Model 30 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Model 30 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Model 30 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Model 30 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Model 30 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Model 30 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Oct 15, 2026.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.