Comparison ledger
OAI Model 30, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Model 30OAI | 1000 FamilyUltratech |
|---|---|---|
| OEM | OAI | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | OAI Model 30 | Ultratech 1000 Family |
| Specifications | ||
| Product family | UV Exposure Systems[1] | — |
| Type | Benchtop collimated UV exposure system[2] | — |
| Source type | Stabilized arc lamp source[2] | — |
| Optical integrator | Adjustable optical integrator[2] | — |
| Output spectra | 220 nm to 450 nm[3] | — |
| Output power | 200 W to 12 kW[3] | — |
| Beam size | Up to 24 in²[3] | — |
| Timer range | 0.1 to 0.999 seconds[3] | — |
| Collimation | Reflective Köhler illumination design[2] | — |
| Beam divergence | ≤ ±1.5°[2] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[4] |
| Optical design | — | Wynne Dyson[4] |
| Magnification | — | 1X[4] |
| Tool class | — | Photolithography step-and-repeat 1X steppers[4] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →