Comparison ledger
OGP 0020 Contour Projector, Onto Innovation Nanospec 210 Thin Film Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Nanospec 210 Thin Film MeasurementOnto Innovation | |
|---|---|---|
| OEM | OGP | Onto Innovation |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | OGP (Optical Gaging Products) 0020 Contour Projector | Onto Innovation Nanospec 210 Thin Film Measurement |
| Specifications | ||
| Configuration | 50-60 Cycle[1] | — |
| Voltage | 115 V[1] | — |
| OEM | OGP (Optical Gaging Products)[2] | — |
| Model | 0020[2] | Nanospec 210[3] |
| Equipment type | Contour Projector[2] | Thin film measurement system[3] |
| Category | Precision Optics[1] | — |
| Manufacturer | — | Onto Innovation[3] |
| Thickness range | — | 100 to 500,000 angstroms[4] |
| Typical measurement time | — | 2.5 seconds[4] |
| Spot size | — | 50 um with 5x objective; 25 um with 10x objective; 6.5 um with 40x objective[4] |
| Film types measured | — | Oxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide[4] |
| Reflectance mode | — | Thick Films[4] |
| Reproducibility | — | 5A ± 5% depending upon the film type[4] |
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