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MetaPulse 200 XCu Metal Film Measurementversus1050 UV-VIS

Onto Innovation MetaPulse 200 XCu Metal Film Measurement, Perkin Elmer 1050 UV-VIS, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1050 UV-VISPerkin Elmer
OEMOnto InnovationPerkin Elmer
CategoryPrecision OpticsPrecision Optics
Wafer sizeWafer Mapping—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyOnto Innovation MetaPulse 200Perkin Elmer 1050 UV-VIS
Specifications
ConfigurationNon copper tool; double path tool delay stage[1]—
Cooling Water Required Minimum Flow0.79 GPM (3.00 l/m)[1]—
Min Temp12 *C (54 *F, 285.00 *K)[1]—
Max Temp20 *C (68 *F, 293 *K)[1]—
Wafer sizeWafer Mapping[1]—
Controller TypePC Controller[1]—
External CoolingWater Cooled[1]—
Cooling Water RequiredMinimum Flow: 0.79 GPM (3.00 l/m) Min Temp: 12 *C (54 *F, 285.00 *K) Max Temp: 20 *C (68 *F, 293 *K)[1]—
Operating Air Pressure14.00 PSI (96,534.20 N/sq m)[1]—
Vacuum Required0.98 in Hg (24.89 mm Hg)[1]—
Asset ID—82948[3]
Last Confirm Date—August 23, 2024[3]
Manufacturer—Perkin Elmer[3]
Model—1050[3]
Instrument type—Spectrometer[3]
Use—Analyzing ultraviolet and visible light absorption spectra[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com