Waferpedia

Comparison ledger

Ion Beam versus PlasmaPro NGP 1000

Oxford Instruments Ion Beam and Oxford Instruments PlasmaPro NGP 1000, side by side. Every value shown is drawn from its cited encyclopedia entry.

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Side-by-side comparison of selected equipment models
Attribute
Ion BeamOxford Instruments
PlasmaPro NGP 1000Oxford Instruments
OEMOxford InstrumentsOxford Instruments
CategoryDepositionDeposition
Wafer size—up to 450mm wafer size
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyOxford Instruments Ion BeamOxford Instruments PlasmaPro NGP 1000
Specifications
ConfigurationDC Hot Wire Filament Ion-Guns[1]Load Locked Chamber[2]
Wafer size—up to 450mm wafer size[2]
Power—600W 13.56Mhz HF RF Generator[2]
Ion Beam entryPlasmaPro NGP 1000 entry

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing