Waferpedia

Oxford Instruments

PlasmaPro NGP 1000

PlasmaPro NGP 1000 — Inventory photo
Fig. 01PlasmaPro NGP 1000Inventory photo[1]

Wafer size

up to 450mm wafer size

Power

600W 13.56Mhz HF RF Generator[1]

Vacuum

Load Lock vacuum pump[1]

Gas delivery

Gas-Shock assisted Chamber Lift Mechanism[1]

What is it?

Oxford Instruments PlasmaPro NGP 1000 is a PECVD system described as capable of running up to 450 mm wafers.

What do the numbers mean?

Power & electrical3

Dual Frequency RF with Pulsing for Film Stress Control[1]
Accurate?
Power
600W 13.56Mhz HF RF Generator[1]
Accurate?
Power
600W 100khz LF RF Generator[1]
Accurate?

Vacuum & pumping2

Adixen ADS602P Dry Pump for Process Chamber[1]
Accurate?
Load Lock vacuum pump[1]
Accurate?

Wafer handling3

Wafer size
up to 450mm wafer size[1]
Accurate?
Load Locked Chamber[1]
Accurate?
Capable of running up 450mm wafers[1]
Accurate?

Gas & chemistry2

Gas-Shock assisted Chamber Lift Mechanism[1]
Accurate?
X20 External Gas Box with up to 12 Gas Lines. Currently Configured for: He, CF4, N2, N20, NH3, SiH4-N2[1]
Accurate?

Control & software3

System PC, Keyboard, Mouse[1]
Accurate?
Windows 7 w/ PC4500 Control Software[1]
Accurate?
X20 PLC[1]
Accurate?

Configuration & options7

490mm Diameter Aluminum Lower Electrode[1]
Accurate?
Up to 400*C[1]
Accurate?
Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition)[1]
Accurate?
Operations Manual and Documentation[1]
Accurate?
Fully Refurbished to excellent condition[1]
Accurate?
Chamber disassembled for refurbishment.[1]
Accurate?
Chamber received full wet clean[1]
Accurate?
Interested in this tool?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationDual Frequency RF with Pulsing for Film Stress Control[1]
  • Power600W 13.56Mhz HF RF Generator[1]
  • Power600W 100khz LF RF Generator[1]
  • ConfigurationGas-Shock assisted Chamber Lift Mechanism[1]
  • ConfigurationAdixen ADS602P Dry Pump for Process Chamber[1]
  • ConfigurationLoad Lock vacuum pump[1]
  • ConfigurationX20 External Gas Box with up to 12 Gas Lines. Currently Configured for: He, CF4, N2, N20, NH3, SiH4-N2[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the PlasmaPro NGP 1000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PlasmaPro NGP 1000 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the PlasmaPro NGP 1000 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the PlasmaPro NGP 1000 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the PlasmaPro NGP 1000 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the PlasmaPro NGP 1000 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Inventory photo
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Last updated Jul 29, 2026.

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