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Comparison ledger

Ionfab 300 Plus IBD versus PECVD4

Oxford Instruments Ionfab 300 Plus IBD and Oxford Instruments PECVD4, side by side. Every value shown is drawn from its cited encyclopedia entry.

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Side-by-side comparison of selected equipment models
Attribute
Ionfab 300 Plus IBDOxford Instruments
PECVD4Oxford Instruments
OEMOxford InstrumentsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyOxford Instruments Ionfab 300Oxford Instruments PECVD4
Cited variants—
  • Oxford PECVD4 - SiOx[1]
  • Oxford PECVD4 - SixNy[1]
Specifications
ContaminationII-VI[2]—
No longer FunctioningSoftware, Automata[2]—
OEM—Oxford Instruments[1]
Model—PECVD4[1]
Full equipment name—Oxford Plasmalab System 100 PECVD System[1]
Process reference—PECVD SiOx Deposition with 81MHz Power[1]
Ionfab 300 Plus IBD entryPECVD4 entry

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Sources (2)Every fact above is drawn from these public sources
  1. [1]nanolab.berkeley.edunanolab.berkeley.edu
  2. [2]inventory listing