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Oxford Instruments

PECVD4

DepositionOxford Instruments PECVD4 family
Research Quality: 30% complete
Oxford InstrumentsPECVD4
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What is it?

The NanoLab listings identify the Oxford Instruments PECVD4 as an Oxford Plasmalab System 100 PECVD system. The process manual also references PECVD SiOx deposition with 81MHz power and PECVD SixNy deposition with 81MHz power for this tool.

What can it run?

Process applications and technology nodes documented for this tool.

  • PECVD
  • SiOx deposition
  • SixNy deposition

What do the numbers mean?

Power & electrical2

Process reference
PECVD SiOx Deposition with 81MHz Power[1]
Accurate?
Process reference
PECVD SixNy Deposition with 81MHz Power[1]
Accurate?

Configuration & options3

OEM
Oxford Instruments[1]
Accurate?
Model
PECVD4[1]
Accurate?
Full equipment name
Oxford Plasmalab System 100 PECVD System[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Oxford PECVD4 - SiOxSiOx process specificationnanolab.berkeley.edu[1]
Oxford PECVD4 - SixNySixNy process specificationnanolab.berkeley.edu[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Process referencePECVD SiOx Deposition with 81MHz Power[1]
  • Process referencePECVD SixNy Deposition with 81MHz Power[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the PECVD4 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PECVD4 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the PECVD4 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the PECVD4 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the PECVD4 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the PECVD4 are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]nanolab.berkeley.edunanolab.berkeley.edunanolab.berkeley.edu
  2. [2]Physical Vapor Depositionnanolab.berkeley.edunanolab.berkeley.edu
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Last updated Jul 29, 2026.

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